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Hafnium Laboratory Supplies for Research & Technology
High-purity hafnium for laboratory supplies, hafnium oxide & sputtering targets for research, thin-film technology and specialty applications at ChemPUR.
High-Purity Hafnium Products
Hafnium in Many Forms & Purities
Showing 1–50 of 62 results
Physical Properties
Melting Point
2,233.0°C
Boiling Point
4,603.0°C
Frequently Asked Questions
Our FAQs provide you with a quick overview of important topics related to our product range. If you have any further questions, we will of course also be happy to assist you personally.
Purchasing / Sales
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Why is ChemPUR the Right Partner for Hafnium Laboratory Supplies?
ChemPUR has stood for high-quality research chemicals, high-purity metals and reliable laboratory supplies for science, research and industry for decades. The predecessor company was founded in 1988; since 1996, ChemPUR has operated as an independent GmbH with a focus on high-purity materials and specialty chemicals. Today, the product range comprises pure and high-purity metals, evaporation materials, sputtering targets and inorganic specialty chemicals for research and development.
Particularly in the field of hafnium, our customers benefit from a broad product range of high-purity metals, hafnium compounds, sputtering targets and evaporation materials. We supply research institutions, development departments and industrial laboratories with materials for synthesis, thin-film technology, analytics and materials development.
As a family-run company, we place great emphasis on personal consultation, short decision-making processes and close collaboration with our customers. Thanks to our worldwide dealer network, we can reliably provide nearly all relevant materials. We also support individual requirements or non-standard product specifications with custom fabrications, customer-specific material solutions and expert technical consultation—particularly for demanding research and development projects.
What is Hafnium Used for in the Laboratory?
Hafnium is used in research and industry wherever high-temperature-resistant, corrosion-resistant and high-performance materials are required. The material plays an important role particularly in materials science, thin-film technology, semiconductor research and high-performance ceramics. Due to its special properties, hafnium is suitable for demanding applications under thermal and chemical stress.
In the laboratory, hafnium is used for materials development, coating technologies, syntheses and analytical applications, among others. Hafnium oxide, for example, serves as a dielectric material in microelectronics and for optical coatings. Hafnium carbide and hafnium nitride, on the other hand, are frequently used in high-temperature materials and hard material applications. Furthermore, hafnium materials are employed in thin-film and PVD processes as well as in the development of new specialty materials.
Precisely defined purities and material qualities are critical for reproducible research results. Therefore, ChemPUR offers a broad portfolio of powders, granules, rods, wires, foils, oxides and sputtering targets for laboratory and development applications. Information on purity, composition or CAS numbers is documented transparently. Technical data sheets and further documentation can be requested at any time.
While many chemical materials or chlorides are soluble in certain media, hafnium is used particularly for its high thermal and chemical stability in demanding research and coating processes. Hafnium-based materials are also employed in applications under controlled oxygen conditions, for example in thin-film technology or in oxidic coatings.
Hafnium materials are also used in special technical fields such as high-temperature technology or applications related to nuclear reactors. Thanks to our international dealer network, we also reliably support research institutions and companies in the worldwide export of high-quality hafnium products.
Which Hafnium Purities Do We Offer?
ChemPUR offers hafnium and hafnium compounds in different purity grades for research, development and industrial specialty applications. Depending on the material and field of application, qualities from 98% up to 99.99% purity are available. Particularly in semiconductor technology, analytics, thin-film technology and high-temperature research, high-purity materials are critical for reliable and reproducible results.
Our range includes metallic hafnium with CAS number 7440-58-6 as well as numerous hafnium compounds. These include hafnium oxide, hafnium carbide, hafnium hydride, hafnium silicide and hafnium sulfide in different purity grades. For hafnium oxide, for example, we offer variants with 99%, 99.9%, 99.95% and 99.99% purity.
For many applications, the lowest possible zirconium content also plays an important role, as even small deviations can influence material properties. Therefore, we ensure consistently high material quality and precise specifications for research and industrial processes.
Our customers benefit from personal consultation in selecting suitable purities and material forms—from powder and granules to sputtering targets or evaporation materials. Particularly for demanding development projects, this considerably facilitates the selection of suitable materials and supports new technical discoveries as well as modern high-performance applications.
In addition to ultra-high-purity materials, we also offer economical qualities for less sensitive applications. The available purity grade varies depending on the product group and specification. Through our broad portfolio, research institutions and companies receive exactly the material quality they need for their processes—from robust standard qualities to particularly easy-to-process high-purity specialty materials.
Which Hafnium Forms Are Available?
At ChemPUR, you receive hafnium in numerous delivery forms for research, development and industrial specialty applications. It is frequently used for applications in materials science, thin-film technology, powder metallurgy and modern coating and laboratory technology. Depending on the field of application, high-purity metals, ceramic compounds and technical specialty forms in different purities and dimensions are available to you.
Our range includes hafnium powder, granules, pieces, foils, rods, blocks and special hafnium wire for laboratory and high-temperature applications, among others. In addition, we offer high-quality sputtering targets and evaporation materials for PVD and vacuum coating processes. Furthermore, our portfolio comprises various hafnium compounds such as hafnium oxides, borides, carbides, nitrides, hydrides, sulfides as well as hafnium chlorides and other inorganic metal-based substances.
We also provide many products in different grain sizes, purities and technical specifications. Information on chemical composition and material quality is always documented transparently. Technical data sheets and further documentation are gladly provided upon request.
In addition to standard products, ChemPUR also supports you with customer-specific custom fabrications and individual material solutions. This allows us to flexibly accommodate different requirements for dimensions, purities or delivery forms. Even with high demand or special project requirements, we support you with personal consultation, technical expertise and materials in the highest available quality. Should a product currently not be available, we are happy to advise on suitable alternatives or comparable material solutions.
Is Hafnium Available as a Sputtering Target?
Yes, ChemPUR offers high-quality hafnium sputtering targets for applications in thin-film technology, PVD processes and vacuum coating. Our targets are used particularly in research, semiconductor technology, materials science and optical coating processes. This enables the production of precise thin films for demanding technical applications.
Our range includes hafnium sputtering targets in different dimensions and purities, including versions with 99.9% purity. In addition, we offer further hafnium materials such as evaporation materials, oxides and other technical materials for modern coating processes. In addition to standard sizes, ChemPUR also supports individual requirements and special formats. This allows any limitations in dimensions or technical specifications to be flexibly accommodated. Even with high demand, we support research institutions and companies with personal consultation and high-quality materials for demanding thin-film applications.
While substances such as hydrochloric acid or other chemical media are used for certain processes in areas such as research and filtration, hafnium is used primarily for sputtering targets in thin-film technology due to its high temperature resistance and material stability. Particularly in PVD and vacuum coating processes, high-purity and thermally stable materials are critical to produce precise and reproducible thin films. Hafnium sputtering targets are used in semiconductor technology, materials research, optics and functional coatings, among others. Due to its high chemical and thermal stability, hafnium is particularly suitable for demanding high-technology applications and coating processes under controlled process conditions.
Does ChemPUR Offer High-Purity Hafnium Oxide?
Yes, ChemPUR offers high-purity hafnium oxide for research, thin-film technology and industrial specialty applications. Hafnium oxide is one of the most important inorganic hafnium substances and is virtually indispensable for numerous applications in modern chemistry, electronics and materials science.
The material is produced from the chemical element hafnium, a rarely occurring technology metal with atomic number 72. Hafnium is one of the strategically important chemical elements for modern high technologies. Due to its natural association with zircon, hafnium often occurs only in small quantities. The complex separation and production of high-purity hafnium compounds therefore takes place under controlled conditions.
ChemPUR offers hafnium oxide in various purity grades such as 99%, 99.9%, 99.95% and 99.99%. Different forms are available, including powder, pieces and vacuum-deposition qualities for coating processes. Depending on the product version, technical specifications such as purity, grain size or mesh are precisely specified. Many variants additionally have a particularly low zirconium content for demanding research and electronics applications.
Hafnium oxide is suitable for thin-film technology, high-performance ceramics, optical coatings and modern semiconductor and vacuum processes, among others. The material thereby forms the basis for numerous innovative applications in research and industry. In addition, our portfolio comprises further high-purity hafnium chemicals, metals and alloys as well as specialty materials from the field of high-pure metals and rare earths.
Thanks to our international dealer network, we can reliably provide many products even in small quantities. Even with limited supply availability or requirements for a strategic material, we support our customers with personal consultation, technical expertise and efficient procurement. Subsequently, we ensure reliable delivery of high-purity materials for research, development and industrial applications.
For Which Applications is Hafnium Oxide Suitable?
Hafnium oxide (HfO₂) is one of the most important ceramic hafnium compounds for research, development and industrial high technology. The material is based on hafnium, a transition metal from the periodic table, and impresses with high thermal stability, chemical resistance and optimal dielectric properties.
Hafnium oxide is particularly frequently used in the semiconductor industry and in modern electronics chemicals. There it serves as a high-k dielectric for thin films, microelectronic components and high-performance coating systems. For such applications, precisely defined purities are critical to enable reproducible results in research and production.
Hafnium oxide is also suitable for optical coatings, high-performance ceramics, protective layers and applications in thin-film and vacuum coating technology. Due to its particularly stable material properties, hafnium oxide is also used in high-temperature research, modern laboratory technology and materials development. New material concepts such as high-entropy materials are also gaining increasing importance in this context.
Since hafnium and zirconium have very similar chemical properties, their technical separation during extraction is demanding. High-purity and particularly pure hafnium oxide is therefore an important raw material for demanding research and industrial processes.
ChemPUR offers hafnium oxide in different purities and delivery forms—for example, as powder or evaporation material for thin-film processes. In addition, our portfolio comprises further hafnium products such as wires, foils, sheets, rods, ingots, sputtering targets and special hafnium chlorides for various applications and industries. In this way, we support research institutions and companies with high-quality materials for modern technologies and future innovations.